Designed and Produced the Rotary Substrate Holder and Its Optimized in Angular DC Magnetron Co-Sputtering System

We report the design approach of a home-built rotary substrate holder on simple rotation stages for low-pressure vacuum applications. The result designing and fabricating that it can be successfully used to rotate in application without pressure fl uctuations leakage. Then we investigated suitable thin fi lm deposition by optimal multilayer coatings under three variable operating conditions: Speed substrate, time, discharge voltage. film copper targets was mounted each magnetron gun, providing total guns. deposited glass slide at room temperature using custom-built angular DC co-sputtering system. Analysis variance response surface regression model thickness as function independent variables shows speed, sputtering voltage, coeffi cient squared time are most signifi cant factors determining optimum thickness. thin-film with voltage 10 rpm, 8.61 min, 200%V, respectively, maximizes 72.036 nm.